Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lithography
Soft-stamped nanoimprint lithography(NIL) is considered as one of the most effective processes of nanoscale patterning because of its low cost and high throughput. In this work, this method is used to emboss the poly(9, 9-dioctylfluorene)film. By reducing the linewidth of the nanogratings on the sta...
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Published in | Chinese physics B Vol. 24; no. 10; pp. 274 - 280 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.10.2015
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Subjects | |
Online Access | Get full text |
ISSN | 1674-1056 2058-3834 1741-4199 |
DOI | 10.1088/1674-1056/24/10/104215 |
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