Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lithography

Soft-stamped nanoimprint lithography（NIL） is considered as one of the most effective processes of nanoscale patterning because of its low cost and high throughput. In this work, this method is used to emboss the poly（9, 9-dioctylfluorene）film. By reducing the linewidth of the nanogratings on the sta...

Full description

Saved in:
Bibliographic Details
Published inChinese physics B Vol. 24; no. 10; pp. 274 - 280
Main Author 李晓慧 俞计成 陆乃彦 张卫东 翁雨燕 顾臻
Format Journal Article
LanguageEnglish
Published 01.10.2015
Subjects
Alignment
Lithography
Mathematical analysis
Modulation
Nanocrystals
Nanostructure
Nanotechnology
Vectors (mathematics)
光栅
共轭聚合物
几何尺寸
压印
图案化
有序排列
纳米定位
纳米晶体
Online AccessGet full text

Cover

More Information
Summary:Soft-stamped nanoimprint lithography（NIL） is considered as one of the most effective processes of nanoscale patterning because of its low cost and high throughput. In this work, this method is used to emboss the poly（9, 9-dioctylfluorene）film. By reducing the linewidth of the nanogratings on the stamp, the orientations of nanocrystals are confined along the grating vector in the nanoimprint process, where the confinement linewidth is comparable to the geometrical size of the nanocrystal. When the linewidth is about 400 nm, the poly（9, 9-dioctylfluorene）（PFO） nanocrystals could be orderly arranged in the nanogratings, so that both pattern transfer and well-aligned nanocrystal arrangement could be achieved in a single step by the soft-stamped NIL. The relevant mechanism of the nanocrystalline alignment in these nanogratings is fully discussed. The modulation of nanocrystal alignment is of benefit to the charge mobilities and other performances of PFO-based devices for the future applications.
Bibliography:Soft-stamped nanoimprint lithography（NIL） is considered as one of the most effective processes of nanoscale patterning because of its low cost and high throughput. In this work, this method is used to emboss the poly（9, 9-dioctylfluorene）film. By reducing the linewidth of the nanogratings on the stamp, the orientations of nanocrystals are confined along the grating vector in the nanoimprint process, where the confinement linewidth is comparable to the geometrical size of the nanocrystal. When the linewidth is about 400 nm, the poly（9, 9-dioctylfluorene）（PFO） nanocrystals could be orderly arranged in the nanogratings, so that both pattern transfer and well-aligned nanocrystal arrangement could be achieved in a single step by the soft-stamped NIL. The relevant mechanism of the nanocrystalline alignment in these nanogratings is fully discussed. The modulation of nanocrystal alignment is of benefit to the charge mobilities and other performances of PFO-based devices for the future applications.
Li Xiao-Hui, Yu Ji-Cheng,Lu Nai-Yan, Zhang Wei-Dong,Weng Yu-Yan,Gu Zhen（a） Center for Soft Condensed Matter Physics and Interdisciplinary Research ＆ College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, China b） Joint Department of Biomedical Engineering, University of North Carolina at Chapel Hill and North Carolina State University, Raleigh, NC 27695, USA
11-5639/O4
conjugated polymer, soft lithography, nanocrystalline material, x-ray technique
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1674-1056
2058-3834
1741-4199
DOI:10.1088/1674-1056/24/10/104215