Electron Beam Lithographic Pixelated Micropolarizer Array for Real-Time Phase Measurement

Pixelated micropolarizer arrays （PMAs） have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320 × 240 aluminum PMA with 7.4 μm pitch is successful...

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Bibliographic Details
Published inChinese physics letters Vol. 31; no. 11; pp. 81 - 84
Main Author 张志刚 董凤良 程腾 钱克矛 仇康 张青川 褚卫国 伍小平
Format Journal Article
LanguageEnglish
Published 01.11.2014
Subjects
Arrays
Diffraction gratings
Electron beam lithography
Ion etching
Mathematical analysis
Polarization
Real time
Surface properties
像素
反应离子蚀刻
实时计算
扫描电子显微镜
物业管理公司
电子束光刻
电感耦合等离子体
相位测量
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Summary:Pixelated micropolarizer arrays （PMAs） have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320 × 240 aluminum PMA with 7.4 μm pitch is successfully fabricated by the proposed technique. The period of the grating is 140nm, and the polarization directions of each of the 2 × 2 units are 0°, 45°, 90°, and 135°. The scanning electron microscopy and optical microscopy results show that the PMA has a good surface characteristic and polarization performances. When the PMA is applied to phase-shifting interferometry, four fringe patterns of different polarization directions are obtained from only one single frame image, and then the object wave phase is calculated in real time.
Bibliography:ZHANG Zhi-Gang, DONG Feng-Liang, CHENG Teng, QIAN Ke-Mao,QIU Kang, ZHANG Qing-Chuan, CHU Wei-Guo, WU Xiao-Ping（ 1.CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Modern Mechanics, University of Science and Technology of China, Hefei 230027; 2.Nanofabrication Laboratory, National Center for Nanoscience and Technology, Beijing 100190; 3.School of Computer Engineering, Nanyang Technological University, Singapore 639798, Singapore）
11-1959/O4
Pixelated micropolarizer arrays （PMAs） have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320 × 240 aluminum PMA with 7.4 μm pitch is successfully fabricated by the proposed technique. The period of the grating is 140nm, and the polarization directions of each of the 2 × 2 units are 0°, 45°, 90°, and 135°. The scanning electron microscopy and optical microscopy results show that the PMA has a good surface characteristic and polarization performances. When the PMA is applied to phase-shifting interferometry, four fringe patterns of different polarization directions are obtained from only one single frame image, and then the object wave phase is calculated in real time.
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/31/11/114208