Fabrication of Through Micro-hole Arrays in Silicon Using Femtosecond Laser Irradiation and Selective Chemical Etching

We demonstrate a method of fabricating through micro-holes and micro-hole arrays in silicon using femtosecond laser irradiation and selective chemical etching. The micro-hole formation mechanism is identified as the chemical reaction of the femtosecond laser-induced structure change zone and hydrofl...

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Bibliographic Details
Published inChinese physics letters Vol. 32; no. 10; pp. 142 - 145
Main Author 高博 陈涛 陈颖 司金海 侯洵
Format Journal Article
LanguageEnglish
Published 01.10.2015
Subjects
Arrays
Chemical etching
Femtosecond
Irradiation
Laser arrays
Lasers
Microscopy
Silicon
光化学反应
制备
制造方法
化学腐蚀
微孔阵列
扫描电子显微镜
硅
飞秒激光辐照
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ISSN0256-307X
1741-3540
DOI10.1088/0256-307X/32/10/107901

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Summary:We demonstrate a method of fabricating through micro-holes and micro-hole arrays in silicon using femtosecond laser irradiation and selective chemical etching. The micro-hole formation mechanism is identified as the chemical reaction of the femtosecond laser-induced structure change zone and hydrofluoric acid solution. The morphologies of the through micro-holes and micro-hole arrays are characterized by using scanning electronic microscopy, The effects of the pulse number on the depth and diameter of the holes are investigated. Honeycomb arrays of through micro-holes fabricated at different laser powers and pulse numbers are demonstrated.
Bibliography:11-1959/O4
We demonstrate a method of fabricating through micro-holes and micro-hole arrays in silicon using femtosecond laser irradiation and selective chemical etching. The micro-hole formation mechanism is identified as the chemical reaction of the femtosecond laser-induced structure change zone and hydrofluoric acid solution. The morphologies of the through micro-holes and micro-hole arrays are characterized by using scanning electronic microscopy, The effects of the pulse number on the depth and diameter of the holes are investigated. Honeycomb arrays of through micro-holes fabricated at different laser powers and pulse numbers are demonstrated.
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ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/32/10/107901