A W-band two-stage cascode amplifier with gain of 25.7 dB
AW-bandtwo-stageamplifierMMIChasbeendevelopedusingafullypassivated 2 × 20 μm gate-width and 0.15 μm gate-length InP-based high electron mobility transistor (HEMT) technology. The two-stage amplifier has been realized in combination with a coplanar waveguide technique and cascode topology, thus leadi...
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Published in | Journal of semiconductors Vol. 34; no. 12; pp. 72 - 76 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.12.2013
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Subjects | |
Online Access | Get full text |
ISSN | 1674-4926 |
DOI | 10.1088/1674-4926/34/12/125003 |
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Summary: | AW-bandtwo-stageamplifierMMIChasbeendevelopedusingafullypassivated 2 × 20 μm gate-width and 0.15 μm gate-length InP-based high electron mobility transistor (HEMT) technology. The two-stage amplifier has been realized in combination with a coplanar waveguide technique and cascode topology, thus leading to a compact chip-size of 1.85 × 0.932 mm^2 and an excellent small-signal gain of 25.7 dB at 106 GHz. Additionally, an inter-digital coupling capacitor blocks low-frequency signal, thereby enhancing the stability of the amplifier. The successful design of the two-stage amplifier MMIC indicates that InP HEMT technology has a great potential for W-band applications. |
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Bibliography: | cascode; coplanar waveguide; HEMT; gate-length 11-5781/TN AW-bandtwo-stageamplifierMMIChasbeendevelopedusingafullypassivated 2 × 20 μm gate-width and 0.15 μm gate-length InP-based high electron mobility transistor (HEMT) technology. The two-stage amplifier has been realized in combination with a coplanar waveguide technique and cascode topology, thus leading to a compact chip-size of 1.85 × 0.932 mm^2 and an excellent small-signal gain of 25.7 dB at 106 GHz. Additionally, an inter-digital coupling capacitor blocks low-frequency signal, thereby enhancing the stability of the amplifier. The successful design of the two-stage amplifier MMIC indicates that InP HEMT technology has a great potential for W-band applications. Zhong Yinghui, Zhang Yuming, Zhang Yimen, Cao Yuxiong, Yao Hongfei, Wang Xiantai, Lu Hongliang, Liu Xinyu, Jin Zhi(1 School of Microelectronics, Xidian University, Xi'an 710071, China 2 Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China) ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1674-4926 |
DOI: | 10.1088/1674-4926/34/12/125003 |