Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (gamma) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with c...

Full description

Saved in:
Bibliographic Details
Published inJournal of alloys and compounds Vol. 457; no. 1-2; pp. 239 - 243
Main Authors XU, Y. W, WANG, H. M
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier 12.06.2008
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Physics
Surface treatments
Intermetallic compounds
Oxide layer
Surface morphology
Laser assisted processing
Ternary alloys
Intermetallics
Laser processing
X-ray diffraction
High temperature alloys
XRD
Oxidation rate
Cracks
Molybdenum Nickel Silicides Mixed
Oxidation resistance
Solid solutions
Oxidation
Microstructure
Thermal stresses
Online AccessGet full text

Cover

More Information
Summary:The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (gamma) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2007.03.047