Novel procedure for the identification of a starting point for the CMP

• Published in: Advanced optical technologies Vol. 11; no. 5; pp. 205 - 213
• Main Authors: Trum, Christian, Sitzberger, Sebastian, Rascher, Rolf
• Format: Journal Article
• Language: English
• Published: Berlin De Gruyter 16.12.2022; Walter de Gruyter GmbH
• Subjects: Boundary conditions; CMP; Machining; Optical properties; polishing; polishing pad; polishing slurry; process design; Slurries; Tolerances
• ISSN: 2192-8576; 2192-8584
• DOI: 10.1515/aot-2022-0022

In the field of precision optics, more and more glass materials that are difficult to machine are being used because of their interesting optical properties. At the same time, the geometries are getting more demanding and the tolerances to be achieved are tighter. The establishment of an efficient process chain is therefore becoming an ever-greater challenge. Particularly in the field of CMP, knowledge of the machining properties of pads and slurries are required to design efficient processes. This knowledge has to be gained through time-consuming in-house tests, as the manufacturers of the consumables are usually only able to provide basic data. In addition, the boundary conditions under which the data were collected are often incomplete defined and thus not comparable. The novel methodical procedure presented here for the initial design of CMP processes is based on a standardized procedure for carrying out the tests. From the resulting database, a starting point for the design of own processes can be identified quickly and unerringly. This article describes the structure of the procedure as well as the necessary background. In addition, the visualization and the procedure for selecting start parameters are discussed using an example application.