Thermal behavior of the amorphous precursors of the ZrO2-GaO1.5 system
The amorphous precursors of the ZrO2-GaO1.5 system on the ZrO2-rich side of the concentration range were prepared by co-precipitation from aqueous solutions of the corresponding salts. Thermal behavior of the amorphous precursors was monitored using differential thermal analysis (DTA), X-ray powder...
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Published in | Journal of alloys and compounds Vol. 460; no. 1-2; pp. 444 - 452 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier
28.07.2008
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Subjects | |
Online Access | Get full text |
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Summary: | The amorphous precursors of the ZrO2-GaO1.5 system on the ZrO2-rich side of the concentration range were prepared by co-precipitation from aqueous solutions of the corresponding salts. Thermal behavior of the amorphous precursors was monitored using differential thermal analysis (DTA), X-ray powder diffraction (XRD), Raman spectroscopy and field emission scanning electron microscopy (FE-SEM). Crystallization temperature of the amorphous precursors rose with an increase in the GaO1.5 content, from 405 deg C (0 mol% GaO1.5) to 720 deg C (50 mol% GaO1.5). The results of Rietveld refinements indicated that the maximum solubility of Ga3+ ions in the ZrO2 lattice (43 mol%) occurred in the metastable products obtained after crystallization of the amorphous precursors. Further thermal treatment caused a decrease of the solubility limits, which became negligible after calcination at 1100 deg C. The results of Raman spectroscopy showed that the incorporation of Ga3+ ions partially stabilized the tetragonal polymorph of ZrO2, but could not stabilize its cubic polymorph. The incorporation of Ga3+ ions caused a linear decrease in the unit-cell volume of the ZrO2-type solid solutions, but the rate of the decrease turned out to be smaller than the rate obtained after the incorporation of bigger Fe3+ ions. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2007.05.075 |