Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

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Bibliographic Details
Published inScientific reports Vol. 11; no. 1; p. 17222
Main Authors Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 20.08.2021
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Bibliography:correction
SourceType-Other Sources-1
content type line 63
ObjectType-Correction/Retraction-1
ISSN:2045-2322
2045-2322
DOI:10.1038/s41598-021-96605-z