Interference type amplifier using intermodal interference in potential channel structures
The proposed structure is a dual gate potential channel having a dimension in the order of 300 angstrom. This dimension is very similar to the dimension of practical tunnel diodes. The dimensions of the proposed amplifier are very small, and may be difficult to fabricate. Recent developments in elec...
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Published in | Solid-state electronics Vol. 35; no. 12; pp. 1841 - 1842 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Oxford
Elsevier Ltd
1992
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | The proposed structure is a dual gate potential channel having a dimension in the order of 300 angstrom. This dimension is very similar to the dimension of practical tunnel diodes. The dimensions of the proposed amplifier are very small, and may be difficult to fabricate. Recent developments in electron beam epitaxy make the fabrication of such structure possible. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/0038-1101(92)90271-D |