Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

• Published in: Chinese physics letters Vol. 31; no. 8; pp. 160 - 162
• Main Author: 王智浩 刘文 左强 王磊 赵彦立 徐智谋
• Format: Journal Article
• Language: English
• Published: 01.08.2014
• Subjects: Diffusion; Masks; Molds; Multilayers; Nanostructure; Photonic crystals; Solubility; Ultraviolet; 光子晶体; 剥离工艺; 图层蒙版; 定义; 悬浮式; 紫外线; 纳米压印; 软模具

The traditional lift-off process can hardly be carried out in ultraviolet nanoimprint defined patterns due to the poor solubility of the ultraviolet resist. Moreover, the depth of lift-off pattern defined by an ultraviolet nanoimprint is limited by that of the soft mold. In this work, a modified nan...