Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

The traditional lift-off process can hardly be carried out in ultraviolet nanoimprint defined patterns due to the poor solubility of the ultraviolet resist. Moreover, the depth of lift-off pattern defined by an ultraviolet nanoimprint is limited by that of the soft mold. In this work, a modified nan...

Full description

Saved in:
Bibliographic Details
Published inChinese physics letters Vol. 31; no. 8; pp. 160 - 162
Main Author 王智浩 刘文 左强 王磊 赵彦立 徐智谋
Format Journal Article
LanguageEnglish
Published 01.08.2014
Subjects
Diffusion
Masks
Molds
Multilayers
Nanostructure
Photonic crystals
Solubility
Ultraviolet
光子晶体
剥离工艺
图层蒙版
定义
悬浮式
紫外线
纳米压印
软模具
Online AccessGet full text

Cover

More Information
Summary:The traditional lift-off process can hardly be carried out in ultraviolet nanoimprint defined patterns due to the poor solubility of the ultraviolet resist. Moreover, the depth of lift-off pattern defined by an ultraviolet nanoimprint is limited by that of the soft mold. In this work, a modified nanoimprint process by a multi-layer mask method is introduced to enhance the depth of the final lift-of[pattern. Pillar photonic crystal is fabricated from the hole pattern defined by NIL to prove the pattern-reversal capability. On its basis, combining the features of overetehing technology and the lateral diffusion phenomenon in the metal depositing process, pillar-shaped photonic crystal stamps with different duty cycles have been fabricated by adjusting the etching time of the lift-off layer. Based on this process, a 50-nm line width metal grating is fabricated from a soft stamp with an aspect ratio as low as 1.
Bibliography:11-1959/O4
The traditional lift-off process can hardly be carried out in ultraviolet nanoimprint defined patterns due to the poor solubility of the ultraviolet resist. Moreover, the depth of lift-off pattern defined by an ultraviolet nanoimprint is limited by that of the soft mold. In this work, a modified nanoimprint process by a multi-layer mask method is introduced to enhance the depth of the final lift-of[pattern. Pillar photonic crystal is fabricated from the hole pattern defined by NIL to prove the pattern-reversal capability. On its basis, combining the features of overetehing technology and the lateral diffusion phenomenon in the metal depositing process, pillar-shaped photonic crystal stamps with different duty cycles have been fabricated by adjusting the etching time of the lift-off layer. Based on this process, a 50-nm line width metal grating is fabricated from a soft stamp with an aspect ratio as low as 1.
WANG Zhi-Hao, LIU Wen, ZUO Qiang, WANG Lei, ZHAO Yan-Li, XU Zhi-Mou（ 1 Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic information Huazhong University of Science and Technology, Wuhan 430074 2State Key Laboratory of Optical Communication Technologies and Networks, Wuhan Research Institute of Posts and Telecommunications, Wuhan 430074）
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/31/8/088102