Staggered band gap n+In0.5Ga0.5As/p+GaAs0.5Sb0.5 Esaki diode investigations for TFET device predictions

We study in this paper the epitaxial growth and electrical characterization of an n+In0.5Ga0.5As/p+GaAs0.5Sb0.5 Esaki diode lattice matched to (001)-oriented InP substrate. First, the effects of molecular beam epitaxy growth temperature and group-V growth rates on the GaAsxSb1−x composition are char...

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Published inJournal of crystal growth Vol. 424; pp. 62 - 67
Main Authors El Kazzi, S., Smets, Q., Ezzedini, M., Rooyackers, R., Verhulst, A., Douhard, B., Bender, H., Collaert, N., Merckling, C., Heyns, M.M, Thean, A.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 15.08.2015
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Summary:We study in this paper the epitaxial growth and electrical characterization of an n+In0.5Ga0.5As/p+GaAs0.5Sb0.5 Esaki diode lattice matched to (001)-oriented InP substrate. First, the effects of molecular beam epitaxy growth temperature and group-V growth rates on the GaAsxSb1−x composition are characterized by means of X-ray diffraction (XRD). It is found that GaAsxSb1−x lattice constant is mainly determined by the Sb4 incorporation rather than the As4 one. After optimization, high quality In0.54Ga0.46As(Si)/GaAs0.52Sb0.48(Be) heterostructure is confirmed by XRD, Transmission electron microscope (TEM) and Secondary Ion Mass Spectroscopy (SIMS) profiles meeting requirements for sub-60mV/dec operating devices. Esaki tunnel diodes are then fabricated to be used as a prediction of Band-To-Band Tunneling (BTBT) for Tunnel Field-Effect transistors (TFETs). The results are compared to previously reported n+/p+In0.5Ga0.5As homojunction diodes, showing a ×60 factor improvement of BTBT current density for the same electric field with an excellent average Peak-to-Valley Current Ratio (PVCR) of 14. •Influence of MBE growth conditions on GaAsSb composition.•High quality InGaAs(Si)/GaAsSb(Be) diodes for sub-60mV/dec operating devices.•x60 BTBT current density improvement using n+InGaAs/p+GaAsSb compared to n+/p+InGaAs.
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2015.05.004