Investigation of synthesized carbazole derivative Cz-BPDB as a high-performance leveler for copper electroplating

Electroplating additives, especially levelers of copper electroplating, are the most critical components of electroplating solutions in the manufacture of printed circuit boards and integrated circuits. A series of carbazole derivatives have been synthesized and used as levelers for through-hole ele...

Full description

Saved in:
Bibliographic Details
Published inSurface & coatings technology Vol. 463; p. 129526
Main Authors Yuan, Bo, Zhou, Wenhao, Li, Xuyang, Xie, Yiqiu, Yin, Xinpeng, Chen, Xin, Shen, Danyan, Wang, Limin
Format Journal Article
LanguageEnglish
Published Elsevier B.V 25.06.2023
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Electroplating additives, especially levelers of copper electroplating, are the most critical components of electroplating solutions in the manufacture of printed circuit boards and integrated circuits. A series of carbazole derivatives have been synthesized and used as levelers for through-hole electroplating. Electrochemical tests, theoretical calculations, and simulations were used to compare the various properties of the carbazole derivatives. Among them, the carbazole derivative Cz-BPDB was preferably subjected to electroplating which was demonstrated by metallographic microscopy, SEM, and XRD. To further investigate the mechanism of leveler Cz-BPDB, the nucleation model theory was used to explain the phenomenon of flat and smooth electroplating surfaces. The electrostatic potential plot and the average local ionization energy plot were employed to analyze the active sites of the Cz-BPDB. Moreover, the galvanostatic measurements were applied to investigate the interaction of the Cz-BPDB with PEG and SPS. Therefore, a more reasonable through-hole electroplating mechanism was proposed in electroplating solution with Cz-BPDB used as leveler. This work introduced an excellent performance leveler and contributed to the continuing development of the copper electroplating mechanism. [Display omitted] •A series of water-soluble carbazole derivatives were designed and synthesized.•Theoretical calculations and simulations verified the electrochemical results.•Ideal electroplating result was achieved in the presence of compound Cz-BPDB.•The Scharifker-Hills model illustrated suppression performance.•A mechanism considering current density and convective intensity was proposed.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2023.129526