β- (Me1, Me2) and MeNx films deposited by magnetron sputtering: Novel heterostructural alloy and compound films

• Published in: Surface & coatings technology Vol. 337; pp. 75 - 81
• Main Authors: Musil, J., Kos, Š., Zenkin, S., Čiperová, Z., Javdošňák, D., Čerstvý, R.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 15.03.2018
• Subjects: Crystal structure; Elemental composition; Energy; Heterostructural films; Magnetron sputtering; WNx; β-phase film; β-Ti(Cr); β-Ti(W); β-Ti(Cr); WNx; Heterostructural films; Magnetron sputtering; Energy; β-phase film; Elemental composition; β-Ti(W); Crystal structure
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/j.surfcoat.2017.12.057

The article reports on the formation of high-temperature β-phase films prepared by magnetron sputtering. The principle of formation of the β-phase films is explained. It is shown that the β-phase films are composed of elements that crystallize in different crystal structures and are a novel class of heterostructural films. The properties of the β-phase films are unique and they are controlled by the crystal structures in which the elements contained in the films crystallize. It means that there are three basic parameters which decide on the resulting properties of the β-phase films: (1) the energy delivered into the film during its growth, (2) the elemental composition of the film and (3) the crystal structure of elements or phases in the film. The existence of many possible combinations of the crystal structure of elements and/or phases in the film makes it possible to develop new advanced heterostructural films with new unique properties. It is a great challenge for the further progress in the field. •Magnetron sputtering of β-phase films.•The β-phase films are novel heterostructural films.•The heterostructural films are composed of elements with different crystal structures.•The properties of films are controlled by energy, elemental composition and crystal structure.