Conducting polymer nanowires fabricated by edge effect of NIL

We present an unconventional nanoimprinting lithography (NIL) method to fabricate conducting polymer nanowires with 93.1 nm width. This method involves the fabrication of a high-resolution mold by edge-directed capillary force and the fabrication of high-resolution conducting polymer wires with the...

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Bibliographic Details
Published inJournal of materials chemistry Vol. 22; no. 24; pp. 1296 - 1299
Main Authors Shi, Gang, Li, Liqiang, Liu, Lingxiao, Xu, Daren, Lu, Nan, Hao, Juanyuan, Huang, Chunyu, Chi, Lifeng
Format Journal Article
LanguageEnglish
Published 01.01.2012
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Summary:We present an unconventional nanoimprinting lithography (NIL) method to fabricate conducting polymer nanowires with 93.1 nm width. This method involves the fabrication of a high-resolution mold by edge-directed capillary force and the fabrication of high-resolution conducting polymer wires with the fabricated mold by NIL. We further demonstrate that, by exploiting the advantages of this method, the application of such structures in the nanosensor area is thus straightforward. The edge effect of NIL is used to fabricating conducting polymer nanowires with feature sizes much smaller than those of the original stamp.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0959-9428
1364-5501
DOI:10.1039/c2jm31006f