A Wafer-Level Sn-Rich Au-Sn Bonding Technique and Its Application in Surface Plasmon Resonance Sensors

Sn-rich Au Sn solder bonding is systematically investigated. High shear strength (64 MPa) and good hermeticity (a leak rate lower than 1 × 10-7 torr.1/s) are obtained for Au-Sn solder with 54wt% Sn bonded at 310℃. The AuSn2 phase with the highest Vickers-hardness among the four stable intermetMlic c...

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Published inChinese physics letters Vol. 31; no. 5; pp. 118 - 121
Main Author 毛旭 吕兴东 魏伟伟 张喆 杨晋玲 祁志美 杨富华
Format Journal Article
LanguageEnglish
Published 01.05.2014
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Summary:Sn-rich Au Sn solder bonding is systematically investigated. High shear strength (64 MPa) and good hermeticity (a leak rate lower than 1 × 10-7 torr.1/s) are obtained for Au-Sn solder with 54wt% Sn bonded at 310℃. The AuSn2 phase with the highest Vickers-hardness among the four stable intermetMlic compounds of the Au Sn system makes a major contribution to the high bonding strength. This bonding technique has been successfully used to package the Surface Plasmon Resonance (SPR) sensors. The Sn-rieh Au-Sn solder bonding provides a reliable, low-cost, low-temperature and wafer-level hermetic packaging solution for the micro-electromechanical system devices and has potential applications in high-end biomedical sensors.
Bibliography:Sn-rich Au Sn solder bonding is systematically investigated. High shear strength (64 MPa) and good hermeticity (a leak rate lower than 1 × 10-7 torr.1/s) are obtained for Au-Sn solder with 54wt% Sn bonded at 310℃. The AuSn2 phase with the highest Vickers-hardness among the four stable intermetMlic compounds of the Au Sn system makes a major contribution to the high bonding strength. This bonding technique has been successfully used to package the Surface Plasmon Resonance (SPR) sensors. The Sn-rieh Au-Sn solder bonding provides a reliable, low-cost, low-temperature and wafer-level hermetic packaging solution for the micro-electromechanical system devices and has potential applications in high-end biomedical sensors.
MAO Xu, LV Xing-Dong, WEI Wei-Wei, ZHANG Zhe, YANG Jin-Ling, QI Zhi-Mei, YANG Fu-Hua( 1Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 2Institute of Electronics, Chinese Academy of Sciences, Beijing 100190 3State Key Laboratorv of Transducer Technology ,Shanghai 200050
11-1959/O4
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/31/5/056803