Depth-dependent mosaic tilt and twist in GaN epilayer: An approximate evaluation
An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evalu- ating the depth-dependent mosaic tilt and twist in wurtzite c-plane GaN epilayers. It is found that (103) plane and (101) plane, among the lattice planes not perpendicular to the sample su...
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Published in | Chinese physics B Vol. 23; no. 6; pp. 569 - 573 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.06.2014
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Online Access | Get full text |
ISSN | 1674-1056 2058-3834 1741-4199 |
DOI | 10.1088/1674-1056/23/6/068102 |
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Abstract | An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evalu- ating the depth-dependent mosaic tilt and twist in wurtzite c-plane GaN epilayers. It is found that (103) plane and (101) plane, among the lattice planes not perpendicular to the sample surface, are the best choices to measure the depth profiles of tilt and twist for a GaN epilayer with a thickness of less than 2 μm according to the diffraction geometry of SAXRD. As an illustration, the depth-sensitive (103)/(101) ω-scans of a 1.4-μm GaN film grown by metal-organic chemical vapor deposition on sapphire substrate are measured and analyzed to show the feasibility of this approach. |
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AbstractList | An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evaluating the depth-dependent mosaic tilt and twist in wurtzite c-plane GaN epilayers. It is found that (103) plane and (101) plane, among the lattice planes not perpendicular to the sample surface, are the best choices to measure the depth profiles of tilt and twist for a GaN epilayer with a thickness of less than 2 mu m according to the diffraction geometry of SAXRD. As an illustration, the depth-sensitive (103)/(101) omega -scans of a 1.4- mu m GaN film grown by metal-organic chemical vapor deposition on sapphire substrate are measured and analyzed to show the feasibility of this approach. An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evalu- ating the depth-dependent mosaic tilt and twist in wurtzite c-plane GaN epilayers. It is found that (103) plane and (101) plane, among the lattice planes not perpendicular to the sample surface, are the best choices to measure the depth profiles of tilt and twist for a GaN epilayer with a thickness of less than 2 μm according to the diffraction geometry of SAXRD. As an illustration, the depth-sensitive (103)/(101) ω-scans of a 1.4-μm GaN film grown by metal-organic chemical vapor deposition on sapphire substrate are measured and analyzed to show the feasibility of this approach. |
Author | 张金风 聂玉虎 周勇波 田坤 哈微 肖明 张进成 郝跃 |
AuthorAffiliation | School of Microelectronics, Key Laboratory of Wide Bandgap Semiconductor Materials and Devices of Ministry of Education, Xidian University, Xi'an 710071, China |
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DocumentTitleAlternate | Depth-dependent mosaic tilt and twist in GaN epilayer: An approximate evaluation |
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Notes | ZhangJin-Feng, Nie Yu-Hu, Zhou Yong-Bo, Tian Kun, Ha Wei, Xiao Ming, Zhang Jin-Cheng, Hao Yue( School of Microelectronics, Key Laboratory of Wide Bandgap Semiconductor Materials and Devices of Ministry of Education, Xidian University, Xi'an 710071, China) mosaic structure, tilt and twist, skew angle x-ray diffraction, GaN An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evalu- ating the depth-dependent mosaic tilt and twist in wurtzite c-plane GaN epilayers. It is found that (103) plane and (101) plane, among the lattice planes not perpendicular to the sample surface, are the best choices to measure the depth profiles of tilt and twist for a GaN epilayer with a thickness of less than 2 μm according to the diffraction geometry of SAXRD. As an illustration, the depth-sensitive (103)/(101) ω-scans of a 1.4-μm GaN film grown by metal-organic chemical vapor deposition on sapphire substrate are measured and analyzed to show the feasibility of this approach. 11-5639/O4 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
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Snippet | An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evalu- ating the depth-dependent mosaic tilt and twist... An approach based on depth-sensitive skew-angle x-ray diffraction (SAXRD) is presented for approximately evaluating the depth-dependent mosaic tilt and twist... |
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SubjectTerms | Approximation Camber Diffraction Feasibility Gallium nitrides Mosaics Planes Tilt X-射线衍射 外延层 扭曲 氮化镓 蓝宝石衬底 评价 金属有机化学气相沉积 马赛克 |
Title | Depth-dependent mosaic tilt and twist in GaN epilayer: An approximate evaluation |
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