CMP Challenges for Advanced Technology Nodes

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Bibliographic Details
Published in	MRS advances Vol. 2; no. 44; pp. 2361 - 2372
Main Authors	Zhang, John H., Huang, Haigou, Greene, Andrew M., Xie, Ruilong, Seo, Soon-Cheon, Montanini, Pietro, Tseng, Wei-Tsu, Tsai, Stan, Malley, Matthew, Fang, Qiang, Patlolla, Raghuveer, Koli, Dinesh, Guo, Dechao, Canaperi, Donald F., Surisetty, Charan, Wynne, Jean E., Kleemeier, Walter, Labelle, Cathy
Format	Journal Article
Language	English
Published	01.01.2017
Online Access	Get full text

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ISSN:	2059-8521 2059-8521
DOI:	10.1557/adv.2017.366