Circuit patterning using laser on transparent material
Glass is chemically very stable at room temperature, and has good resistance to gas, bacteria and organisms. It is also used in many industrial fields owing to its property of transmitting light. In particular, because of the recent developments in electronics, the industrial demand for a process fo...
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Published in | Surface & coatings technology Vol. 315; pp. 377 - 384 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
15.04.2017
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Subjects | |
Online Access | Get full text |
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Summary: | Glass is chemically very stable at room temperature, and has good resistance to gas, bacteria and organisms. It is also used in many industrial fields owing to its property of transmitting light. In particular, because of the recent developments in electronics, the industrial demand for a process for generating conductive circuit patterns on glass surfaces is increasing rapidly. Circuit patterns on glass are mainly by a special non-contact processing method using a laser beam or a chemical methods. However this method has disadvantages such as low conductivity, high cost and limitation on the size of the material. To solve this problem, processes such as LCLD have been widely studied. However they have disadvantages such as slow speed and limitation on the materials. Therefore, in this study, generation of circuit pattern was tried using the LIBWE process, which is capable of machining the glass regardless of the characteristics of the glass with a relatively simple equipment configuration. In particular, processing of glass was done to create a rough surface and form a seed layer for electroless deposition using a general-purpose laser beam having a wavelength of 1064nm. Through this method, it is possible to achieve good productivity, and produce conductive and adhesive circuit patterns by a simple process than by traditional processes.
•Fabrication of conductive pattern on glass using electroless deposition.•Forming metal seed layer using LIBWE process.•Selectively conductive patterning without mask.
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ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2017.02.049 |