A gate enhanced power U-shaped MOSFET integrated with a Schottky rectifier

An accumulation gate enhanced power U-shaped metal-oxide-semiconductor field-effect-transistor(UMOSFET) integrated with a Schottky rectifier is proposed.In this device,a Schottky rectifier is integrated into each cell of the accumulation gate enhanced power UMOSFET.Specific on-resistances of 7.7 m.m...

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Published inChinese physics B Vol. 21; no. 5; pp. 441 - 444
Main Author 黄庆 刘鹏 刘涛 郭沙沙 王雪林 王颖 焦文利 胡海帆 刘云涛 曹菲
Format Journal Article
LanguageEnglish
Published 01.05.2012
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ISSN1674-1056
2058-3834
1741-4199
DOI10.1088/1674-1056/21/5/056104

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Summary:An accumulation gate enhanced power U-shaped metal-oxide-semiconductor field-effect-transistor(UMOSFET) integrated with a Schottky rectifier is proposed.In this device,a Schottky rectifier is integrated into each cell of the accumulation gate enhanced power UMOSFET.Specific on-resistances of 7.7 m.mm 2 and 6.5 m.mm 2 for the gate bias voltages of 5 V and 10 V are achieved,respectively,and the breakdown voltage is 61 V.The numerical simulation shows a 25% reduction in the reverse recovery time and about three orders of magnitude reduction in the leakage current as compared with the accumulation gate enhanced power UMOSFET.
Bibliography:accumulation; Schottky source; reverse recovery time; leakage current
An accumulation gate enhanced power U-shaped metal-oxide-semiconductor field-effect-transistor(UMOSFET) integrated with a Schottky rectifier is proposed.In this device,a Schottky rectifier is integrated into each cell of the accumulation gate enhanced power UMOSFET.Specific on-resistances of 7.7 m.mm 2 and 6.5 m.mm 2 for the gate bias voltages of 5 V and 10 V are achieved,respectively,and the breakdown voltage is 61 V.The numerical simulation shows a 25% reduction in the reverse recovery time and about three orders of magnitude reduction in the leakage current as compared with the accumulation gate enhanced power UMOSFET.
Wang Ying,Jiao Wen-Li,Hu Hai-Fan,Liu Yun-Tao,and Cao Fei College of Information and Communication Engineering,Harbin Engineering University,Harbin 150001,China
11-5639/O4
ObjectType-Article-1
SourceType-Scholarly Journals-1
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content type line 23
ISSN:1674-1056
2058-3834
1741-4199
DOI:10.1088/1674-1056/21/5/056104