Waveguide sidewall roughness measurement on full wafers by SEM‐based stereoscopy
Summary We present a technique aiming at sidewall roughness measurement on integrated optical silica waveguides using a scanning electron microscope. The technique uses the principles of stereoscopy to retrieve sidewall topography. Practical implementation details and first results are provided.
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| Published in | Journal of microscopy (Oxford) Vol. 217; no. 3; pp. 188 - 192 |
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| Main Authors | , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Oxford, UK
Blackwell Science Ltd
01.03.2005
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| Online Access | Get full text |
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| Summary: | Summary
We present a technique aiming at sidewall roughness measurement on integrated optical silica waveguides using a scanning electron microscope. The technique uses the principles of stereoscopy to retrieve sidewall topography. Practical implementation details and first results are provided. |
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| Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
| ISSN: | 0022-2720 1365-2818 |
| DOI: | 10.1111/j.1365-2818.2005.01387.x |