Preparation of nitrogen-containing carbon films by electrolysis of organic solutions

• Published in: Thin solid films Vol. 339; no. 1-2; pp. 34 - 37
• Main Authors: SHEN, M.-R, GAN, Z.-Q, GE, S.-B, YU XIN, JI, M.-R
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier Science 08.02.1999
• Subjects: Cross-disciplinary physics: materials science; rheology; Electrodeposition, electroplating; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Raman spectra; Fourier transformation; Atmospheric pressure; Doping; Amorphous state; Infrared spectra; Experimental study; Carbon; Photoelectron spectroscopy; Thin films; Organic solution; Ammonia; Nonmetals; Chemical bonds; Electrodeposition; X radiation; Nitrogen additions; Low temperature; Methanol

The deposition of nitrogen-containing carbon films on silicon substrates at atmospheric pressure and low temperature has been carried out by electrolysis of methanol and ammonia solutions. Amorphous carbon films containing about 8% nitrogen were obtained. The observed C-N vibration bonds by Raman an...