Preparation of nitrogen-containing carbon films by electrolysis of organic solutions

The deposition of nitrogen-containing carbon films on silicon substrates at atmospheric pressure and low temperature has been carried out by electrolysis of methanol and ammonia solutions. Amorphous carbon films containing about 8% nitrogen were obtained. The observed C-N vibration bonds by Raman an...

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Bibliographic Details
Published inThin solid films Vol. 339; no. 1-2; pp. 34 - 37
Main Authors SHEN, M.-R, GAN, Z.-Q, GE, S.-B, YU XIN, JI, M.-R
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier Science 08.02.1999
Subjects
Cross-disciplinary physics: materials science; rheology
Electrodeposition, electroplating
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Raman spectra
Fourier transformation
Atmospheric pressure
Doping
Amorphous state
Infrared spectra
Experimental study
Carbon
Photoelectron spectroscopy
Thin films
Organic solution
Ammonia
Nonmetals
Chemical bonds
Electrodeposition
X radiation
Nitrogen additions
Low temperature
Methanol
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Summary:The deposition of nitrogen-containing carbon films on silicon substrates at atmospheric pressure and low temperature has been carried out by electrolysis of methanol and ammonia solutions. Amorphous carbon films containing about 8% nitrogen were obtained. The observed C-N vibration bonds by Raman and FTIR spectroscopy and the chemical states by XPS of C and N atoms indicate that the carbon and nitrogen are sp super(2) and sp super(3) chemically bonded in the films. Schemes for film growth in the liquid phase were suggested.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(98)01054-2