Superconducting YBaCuO thin films by Cu-ion implantation

• Published in: Journal of applied physics Vol. 69; no. 4; pp. 2397 - 2404
• Main Authors: HUBBARD, K. M, BORDES, N, NASTASI, M, TESMER, J. R
• Format: Journal Article
• Language: English
• Published: Woodbury, NY American Institute of Physics 15.02.1991
• Subjects: 360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication; ALKALINE EARTH METAL COMPOUNDS; ANNEALING; BARIUM COMPOUNDS; BARIUM OXIDES; CHALCOGENIDES; CHANNELING; COHERENT SCATTERING; Condensed matter: structure, mechanical and thermal properties; COPPER COMPOUNDS; COPPER OXIDES; DIFFRACTION; ELECTRON MICROSCOPY; Exact sciences and technology; HEAT TREATMENTS; HIGH-TC SUPERCONDUCTORS; ION CHANNELING; ION IMPLANTATION; MATERIALS SCIENCE; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; Physics; SCANNING ELECTRON MICROSCOPY; SCATTERING; Solid surfaces and solid-solid interfaces; SUPERCONDUCTORS; Surface and interface dynamics and vibrations; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; TRANSITION ELEMENT COMPOUNDS; X-RAY DIFFRACTION; YTTRIUM COMPOUNDS; YTTRIUM OXIDES; Crystal growth; Ion implantation; Transition metal Compounds; Experimental study; Barium Copper Yttrium Oxides Mixed; High temperature superconductor; Inorganic compound; Thin film
• ISSN: 0021-8979; 1089-7550
• DOI: 10.1063/1.348692

We have investigated the fabrication of thin-film superconductors by Cu-ion implantation into initially Cu-deficient Y(BaF2)Cu thin films. The precursor films were co-evaporated on SrTiO3 substrates, and subsequently implanted to various doses with 400 keV 63Cu2+. Implantations were performed at both LN2 temperature, and at 380 °C. The films were post-annealed in oxygen, and characterized as a function of dose by four-point probe analysis, x-ray diffraction, ion-beam backscattering and channeling, and scanning electron microscopy. It was found that a significant improvement in film quality could be achieved by heating the films to 380 °C during the implantation. The best films made became fully superconducting at 60–70 K, and exhibited good metallic R vs T behavior in the normal state.