The boosting electrocatalytic OER and 4-nitrophenol oxidation over bimetallic ZIF-67/Fe2O3 p-n conjunction: Experiments and DFT calculations
In the Co/Cu-ZIF/Fe2O3 p-n junction, the electrons flow from n-type Fe2O3 to p-type bimetallic Co/Cu-ZIF, resulting in the band bending and inner electric field from positive Fe2O3 to negative Co/Cu-ZIF. The density function theory calculation uncovered that such an electronic property change could...
Saved in:
Published in | Journal of alloys and compounds Vol. 937; p. 168373 |
---|---|
Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
15.03.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | In the Co/Cu-ZIF/Fe2O3 p-n junction, the electrons flow from n-type Fe2O3 to p-type bimetallic Co/Cu-ZIF, resulting in the band bending and inner electric field from positive Fe2O3 to negative Co/Cu-ZIF. The density function theory calculation uncovered that such an electronic property change could boost the water oxidation performance. Experiments reveal that the obtained Co/Cu-ZIF(1/1)/Fe2O3 heterojunction achieves a low overpotential of 273 mV and a small Tafel slope of 133.6 mV·dec-1 at 10 mA·cm-2 current density, which are significantly lower than that of monometallic Co-ZIF and FC substrate. Moreover, the p-n conjunction can promote the electrocatalytic degradation of 4-nitrophenol, and the removal rate reaches 80%, current efficiency (23.97%) and low energy consumption (79.5 Wh·L-1) at 50 mA·cm-2. Therefore, it is expected that MOFs-based p-n conjunction with modulation of electron configuration is a promising alternative to boost the electrochemical water oxidation.
[Display omitted]
•The monolithic electrode of Co/Cu-ZIF/Fe2O3 p-n junction integrated OER and oxidation of 4-NP.•The doping of second Cu center induced the high-valence Co3+ active sites and the O-containing intermediates.•The band bending and Co3+ led to charge redistribution and electron transfer, boosting the electrocatalytic activities. |
---|---|
ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2022.168373 |