GMR in corrugated Co/Cu multilayers

A new corrugated material comprising antiferromagnetically coupled Co/Cu multilayers was prepared using V-grooved Si substrates. Scanning electron microscopy and X-ray diffraction observations indicate that the corrugated multilayers were successfully grown with the formation of smooth and clear int...

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Bibliographic Details
Published inIEEE transactions on magnetics Vol. 33; no. 5; pp. 3535 - 3537
Main Authors Maeda, A., Tanuma, T., Kume, M., Shimizu, R., Doi, A.
Format Journal Article
LanguageEnglish
Published IEEE 01.09.1997
Subjects
Antiferromagnetic materials
Geometry
Giant magnetoresistance
Magnetic anisotropy
Magnetic materials
Magnetic multilayers
Nonhomogeneous media
Perpendicular magnetic anisotropy
Scanning electron microscopy
Substrates
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Summary:A new corrugated material comprising antiferromagnetically coupled Co/Cu multilayers was prepared using V-grooved Si substrates. Scanning electron microscopy and X-ray diffraction observations indicate that the corrugated multilayers were successfully grown with the formation of smooth and clear interfaces. Magnetoresistance change with the sense current normal to the grooves was larger than that with the current parallel to the grooves. The MR enhancement due to the difference in measurement geometry increased as the width of the grooves decreased.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9464
1941-0069
DOI:10.1109/20.619489