Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium

In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of...

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Bibliographic Details
Published inTechnical physics Vol. 64; no. 4; pp. 518 - 522
Main Authors Sypchenko, V. S., Tsailun, Van, Nikitenkov, N. N., Tyurin, Yu. I., Sigfusson, T. I., Kiseleva, E. S.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.04.2019
Springer
Springer Nature B.V
Subjects
Aluminum
Aluminum oxide
Classical and Continuum Physics
Coefficient of friction
Dielectric films
Electric properties
Film thickness
Hydrogen
Oxide coatings
Physical Science of Materials
Physics
Physics and Astronomy
Thin films
Titanium
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Summary:In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined.
ISSN:1063-7842
1090-6525
DOI:10.1134/S1063784219040236