Wettability analysis of laser deposited Ti:Sapphire

The wetting properties for materials in the optical and microelectronic sector are of prime importance for a variety of process and preparation steps. Etching, and wafer direct bonding are only two of the relevant areas of application. Laser deposited Ti:Sapphire holds strong relevance for potential...

Full description

Saved in:
Bibliographic Details
Published inApplied surface science Vol. 208; pp. 651 - 657
Main Authors Schmidt, M.J.J., Li, L.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 15.03.2003
Subjects
Laser
PLD
Silicon
Thin film
Ti:Sapphire
Wettability
PLD
Wettability
Silicon
Ti:Sapphire
Laser
Thin film
Online AccessGet full text

Cover

More Information
Summary:The wetting properties for materials in the optical and microelectronic sector are of prime importance for a variety of process and preparation steps. Etching, and wafer direct bonding are only two of the relevant areas of application. Laser deposited Ti:Sapphire holds strong relevance for potential application on micro-electronic and micro-optical integration. The analysis of their wettability performance is therefore of relevance for potential engineering and manufacturing processes. In this paper, we evaluate the wettability of the deposited film systems, dependent on deposition parameters, to determine the polar and dispersive intermolecular forces of the material by using a control system of liquids. An interpretation of the results, in view of the deposition parameters and potential manufacturing applications is attempted.
ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(02)01417-4