Absolute coverage measurement of a NaCl layer on InP(001) using SPIX
The absolute coverage of chlorine on an InP(001) substrate has been determined by a measurement of the Cl K X-ray yield produced by 1.8 MeV 4He + ions incident on an evaporated NaCl thin film of thickness 6.3 nm. A novel experimental geometry has been employed wherein the emitted X-rays are detected...
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Published in | Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Vol. 122; no. 1; pp. 93 - 98 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
1997
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Online Access | Get full text |
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Summary: | The absolute coverage of chlorine on an InP(001) substrate has been determined by a measurement of the Cl K X-ray yield produced by 1.8 MeV
4He
+ ions incident on an evaporated NaCl thin film of thickness 6.3 nm. A novel experimental geometry has been employed wherein the emitted X-rays are detected at grazing exit angles with respect to the target surface. In this configuration, the intensities of all substrate X-rays (P K, In L and bremsstrahlung) are reduced by a factor of ∼ 60 when the exciting beam is axially channeled along the 〈011〉 crystallographic direction. |
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ISSN: | 0168-583X 1872-9584 |
DOI: | 10.1016/S0168-583X(96)00709-4 |