Absolute coverage measurement of a NaCl layer on InP(001) using SPIX

The absolute coverage of chlorine on an InP(001) substrate has been determined by a measurement of the Cl K X-ray yield produced by 1.8 MeV 4He + ions incident on an evaporated NaCl thin film of thickness 6.3 nm. A novel experimental geometry has been employed wherein the emitted X-rays are detected...

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Bibliographic Details
Published inNuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Vol. 122; no. 1; pp. 93 - 98
Main Authors Xia, H., Lennard, W.N., Rodríguez-Fernández, L., Massoumi, G.R.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 1997
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Summary:The absolute coverage of chlorine on an InP(001) substrate has been determined by a measurement of the Cl K X-ray yield produced by 1.8 MeV 4He + ions incident on an evaporated NaCl thin film of thickness 6.3 nm. A novel experimental geometry has been employed wherein the emitted X-rays are detected at grazing exit angles with respect to the target surface. In this configuration, the intensities of all substrate X-rays (P K, In L and bremsstrahlung) are reduced by a factor of ∼ 60 when the exciting beam is axially channeled along the 〈011〉 crystallographic direction.
ISSN:0168-583X
1872-9584
DOI:10.1016/S0168-583X(96)00709-4