Chemical vapor deposition and photoluminescent properties of polycrystalline AlN films

Thick polycrystalline aluminum nitride films have been grown by chemical vapor deposition using metallic aluminum and ammonium chloride. The films have been characterized by scanning electron microscopy and photoluminescence spectroscopy. The results have been used to analyze correlations between th...

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Bibliographic Details
Published inInorganic materials Vol. 42; no. 6; pp. 627 - 631
Main Authors Red'kin, A N, Gruzintsev, A N, Makovei, Z I, Tatsii, V I, Yakimov, E E
Format Journal Article
LanguageEnglish
Published 01.06.2006
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Summary:Thick polycrystalline aluminum nitride films have been grown by chemical vapor deposition using metallic aluminum and ammonium chloride. The films have been characterized by scanning electron microscopy and photoluminescence spectroscopy. The results have been used to analyze correlations between the main process parameters.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0020-1685
1608-3172
DOI:10.1134/S0020168506060094