Results for dissociative sticking from a parametrization of an exactly solvable model

A previously published exactly solvable quantum mechanical model is used to calculate the dissociative sticking coefficients for H 2/Cu(111) and O 2/Ag(110). The model well describes the sticking coefficient for incident translational energies significantly higher than the activation threshold. Furt...

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Bibliographic Details
Published inChemical physics letters Vol. 263; no. 3; pp. 597 - 601
Main Authors Brivio, G.P., Rossi, M.L., Grimley, T.B.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 13.12.1996
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Summary:A previously published exactly solvable quantum mechanical model is used to calculate the dissociative sticking coefficients for H 2/Cu(111) and O 2/Ag(110). The model well describes the sticking coefficient for incident translational energies significantly higher than the activation threshold. Furthermore, for H 2/Cu(111), the low-energy behaviour is accurately described by allowing the interchannel coupling to depend on the translational energy of the incoming molecule, and then by averaging over a distribution of couplings simulating late activation barriers of different heights.
ISSN:0009-2614
1873-4448
DOI:10.1016/S0009-2614(96)01217-1