Calculation of stress intensities at sharp notches in anisotropic media
We present a procedure to calculate mode I and II notch stress intensities in anisotropic media using the path-independent H-integral. The method is based on coupling the analysis of asymptotic stress and displacement fields near a sharp notch with a path independent integral that results from the a...
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Published in | Engineering fracture mechanics Vol. 61; no. 5; pp. 635 - 654 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.11.1998
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Subjects | |
Online Access | Get full text |
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Summary: | We present a procedure to calculate mode I and II notch stress intensities in anisotropic media using the path-independent H-integral. The method is based on coupling the analysis of asymptotic stress and displacement fields near a sharp notch with a path independent integral that results from the application of Betti's reciprocal theorem to the notched solid. The approach is demonstrated for two loading/geometry combinations that arise naturally in etched single crystal silicon: mode I loading of a 70.53° notch and mixed mode I and II loading of a
T-structure with a 90° notch. Results agree well with those obtained by correlating computed notch-flank displacements with the asymptotic solution. |
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ISSN: | 0013-7944 1873-7315 |
DOI: | 10.1016/S0013-7944(98)00039-3 |