The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

The deposition of 2Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectros...

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Bibliographic Details
Published inJournal of electron spectroscopy and related phenomena Vol. 98-99; pp. 139 - 148
Main Authors Fisher, G.L, Hooper, A, Opila, R.L, Jung, D.R, Allara, D.L, Winograd, N
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.01.1999
Subjects
Infrared
Metal deposition
Monolayer
Overlayer
Time-of-flight
Monolayer
Metal deposition
Overlayer
Infrared
Time-of-flight
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Summary:The deposition of 2Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.
ISSN:0368-2048
1873-2526
DOI:10.1016/S0368-2048(98)00283-7