Some properties of sputtered a-C:H

Highly tetrahedral, hydrogenated amorphous carbon (a-C:H) films have been deposited using rf sputtering of graphite by a magnetron sputter source in Ar/CH 4 atmosphere. The density, the structural properties, the optical band gap and Urbach energy of the deposited films were studied as a function of...

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Bibliographic Details
Published inJournal of non-crystalline solids Vol. 299; pp. 835 - 839
Main Authors Lazar, G, Vascan, I, Lazar, I, Stamate, M
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.04.2002
Subjects
78.30.Ly
78.66.Jg
A190
I160
81.15.Cd
S370
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Summary:Highly tetrahedral, hydrogenated amorphous carbon (a-C:H) films have been deposited using rf sputtering of graphite by a magnetron sputter source in Ar/CH 4 atmosphere. The density, the structural properties, the optical band gap and Urbach energy of the deposited films were studied as a function of applied bias voltage on substrate and gas pressure during deposition. The films structure was studied using IR absorption spectroscopy. The variation of the optical band gap is considered to be the result of transition from unsaturated graphitic sp 2 bonds to tetrahedral diamond-like sp 3 bonds in the film.
ISSN:0022-3093
1873-4812
DOI:10.1016/S0022-3093(01)00987-5