Intrinsic stress in DC sputtered niobium

The intrinsic mechanical stress of DC-magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point is always characterized by the same cathode-current-Ar-pre...

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Bibliographic Details
Published inIEEE transactions on applied superconductivity Vol. 3; no. 2; pp. 3029 - 3031
Main Authors Booi, P.A.A., Livingston, C.A., Benz, S.P.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.06.1993
Institute of Electrical and Electronics Engineers
Subjects
Applied sciences
Argon
Cathodes
Compressive stress
Electronics
Exact sciences and technology
Magnetic separation
Materials
Niobium
Sputtering
Stress measurement
Substrates
Superconducting films
Voltage
Internal stress
Experimental study
Mechanical stress
Superconductor circuit
Niobium
Sputter coating
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Summary:The intrinsic mechanical stress of DC-magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point is always characterized by the same cathode-current-Ar-pressure relationship.< >
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1051-8223
1558-2515
DOI:10.1109/77.257236