Abnormal bipolar resistive switching behavior in carbon-iron composite films with different thicknesses

Carbon-iron composite films with different thicknesses (50, 100 and 150 nm) were deposited by DC magnetron sputtering method using a composite target (Fe: 4 at%, C: 96 at%). The resistive switching behaviors of Pt/Al/a-C:Fe/Au/Ti structures with different a-C:Fe film thicknesses are investigated. Ab...

Full description

Saved in:
Bibliographic Details
Published inVacuum Vol. 135; pp. 115 - 120
Main Authors Zhou, J.W., Li, T.R., Zhang, D., Ren, B., Zhang, S.W., Huang, J., Zhang, J.M., Wang, L., Jiang, Y.C., Gao, J., Wang, L.J.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.01.2017
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Carbon-iron composite films with different thicknesses (50, 100 and 150 nm) were deposited by DC magnetron sputtering method using a composite target (Fe: 4 at%, C: 96 at%). The resistive switching behaviors of Pt/Al/a-C:Fe/Au/Ti structures with different a-C:Fe film thicknesses are investigated. Abnormal bipolar resistive switching characteristics were observed in all Pt/Al/a-C:Fe/Au/Ti memory cells. Considering the endurance and retention properties, the RRAM cell with 100 nm thick a-C:Fe film as the dielectric layer showed the best performance with on/off-resistance ratio ∼10, and retention time >104 s. Based on the results of the X-ray photoelectron spectroscopy depth profile, the resistive switching behavior is attributed to mutative Al3+ fraction at the Al/a-C:Fe interface and the migration of Au ions between two electrodes. •Abnormal bipolar resistive switching characteristics were observed in all Pt/Al/a-C:Fe/Au/Ti memory cells.•The resistive switching behavior is attributed to mutative Al3+ fraction at the Al/a-C:Fe interface.•The influences of the variation in Schottky barrier height near the Al interface were also discussed.
ISSN:0042-207X
1879-2715
DOI:10.1016/j.vacuum.2016.10.034