SIMS and GDMS depth profile analysis of hard coatings

Rapid development in hard coating technology calls for simple construction depth profile analysers. Here we present results of depth profile analysis of a set of Ar arc plasma deposited TiN, CrN layers. The results are obtained with the use of recently constructed simple glow discharge mass spectrom...

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Bibliographic Details
Published inVacuum Vol. 82; no. 10; pp. 1133 - 1136
Main Authors Konarski, Piotr, Kaczorek, Krzysztof, Ćwil, Michał, Marks, Jerzy
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 03.06.2008
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Summary:Rapid development in hard coating technology calls for simple construction depth profile analysers. Here we present results of depth profile analysis of a set of Ar arc plasma deposited TiN, CrN layers. The results are obtained with the use of recently constructed simple glow discharge mass spectrometer (GDMS) and compared with secondary ion mass spectrometer (SIMS). In SIMS (SAJW-05 model) we apply 5 keV Ar + ion beam of about 100 μm in diameter. Digitally controlled spiral scanning of primary ion beam is performed over 1.6 mm 2 area. Secondary ions are extracted from the central part due to an “electronic gate” and analysed by quadrupole mass spectrometer QMA-410 Balzers (16 mm rods). GDMS analyses are performed on SMWJ-01 glow discharge prototype spectrometer. To supply discharge in 1 hPa argon we use 1.5 kV DC voltage. The analysed sample works as a cathode in a discharge cell. Area of the analysis is ∼4 mm 2 due to the use of secondary cathode—high purity tantalum diaphragm. Sputtered atoms are ionised, next extracted into the analytical chamber and finally analysed by the quadrupole mass analyser SRS-200 (6 mm rods). The results show that the use of simple construction GDMS analyser allows obtaining similar or even slightly better depth resolution than it can be obtained in the SIMS spectrometer. Application of glow discharge analysis opens new possibilities in direct quantitative depth profile analysis of hard coatings.
ISSN:0042-207X
1879-2715
DOI:10.1016/j.vacuum.2008.01.041