Crack resistance of bismuth ferrite films obtained on a flexible substrate

Ultrathin BiO x and FeO x layers were obtained by Atomic Layer Deposition (ALD) on the surface of a flexible Kapton substrate (poly (4,4’-oxydiphenylene-pyromellitimide)) at a temperature of 250 °C. The layer thickness was 50 - 100 nm. Surface morphology, electrical polarization, and mechanical prop...

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Bibliographic Details
Published inE3S Web of Conferences Vol. 295; p. 4008
Main Authors Ramazanov, Shikhgasan, Ţălu, Ştefan, Sobola, Dinara, Orudzev, Farid, Ramazanov, Guseyn, Selimov, Daud, Kaspar, Pavel, Macků, Robert, Nazarov, Anton
Format Journal Article Conference Proceeding
LanguageEnglish
Published Les Ulis EDP Sciences 01.01.2021
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Summary:Ultrathin BiO x and FeO x layers were obtained by Atomic Layer Deposition (ALD) on the surface of a flexible Kapton substrate (poly (4,4’-oxydiphenylene-pyromellitimide)) at a temperature of 250 °C. The layer thickness was 50 - 100 nm. Surface morphology, electrical polarization, and mechanical properties were investigated by Atomic Force Microscope, Piezoelectric Force Microscopy and Force Modulation Microscopy. Chemical analysis was performed by X-ray Photoelectron Spectroscopy, where the formation of Bi2O 3 and Fe2O 3 phases, as well as intermediate phases in the Bi-Fe-O system, was observed. With a small increase in the Bi content of the film, the BFO / Kapton structure becomes more crack resistant. Modification of the Kapton surface with bismuth and iron oxides showed that such a composition exhibits multiferroic behavior.
ISSN:2267-1242
2555-0403
2267-1242
DOI:10.1051/e3sconf/202129504008