The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics
It is known that gas flow rate is a key factor in controlling industrial plasma processing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effects of the gas flow rate on the plasma parameters are calculated and the results show...
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Published in | Plasma science & technology Vol. 16; no. 7; pp. 669 - 676 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.07.2014
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Subjects | |
Online Access | Get full text |
ISSN | 1009-0630 |
DOI | 10.1088/1009-0630/16/7/07 |
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