Characteristic Features of Multilayer Photonic Bandgap Fiber Fabrication

— We have demonstrated a modified chemical vapor deposition (MCVD) process for the fabrication of multilayer photonic bandgap fiber based on high-purity silica glass. Sequential growth of layers differing in melting point has been shown to lead to distortion of the layers in the resulting photonic b...

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Bibliographic Details
Published inInorganic materials Vol. 55; no. 1; pp. 85 - 89
Main Authors Salganskii, M. Yu, Khopin, V. F., Guryanov, A. N., Bubnov, M. M., Likhachev, M. E.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 2019
Springer Nature B.V
Subjects
Chemical composition
Chemical vapor deposition
Chemistry
Chemistry and Materials Science
Industrial Chemistry/Chemical Engineering
Inorganic Chemistry
Materials Science
Melting points
Multilayers
Optical properties
Organic chemistry
Photonic band gaps
Photonics
Silica glass
Silicon dioxide
optical loss
photonic bandgap fiber
MCVD process
refractive index profile
germanosilicate glass
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Summary:— We have demonstrated a modified chemical vapor deposition (MCVD) process for the fabrication of multilayer photonic bandgap fiber based on high-purity silica glass. Sequential growth of layers differing in melting point has been shown to lead to distortion of the layers in the resulting photonic bandgap structure and a sharp rise in optical loss as a result of deviations from Bragg’s reflection conditions. By optimizing the chemical composition of the layers in the photonic bandgap structure, we were able to suppress excessive optical losses and reach the optical loss limit, which is only determined by the guidance properties of the photonic bandgap structure itself.
ISSN:0020-1685
1608-3172
DOI:10.1134/S0020168519010096