Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 48; no. 6S; p. 6
Main Authors Shiono, Daiju, Hada, Hideo, Hirayama, Taku, Onodera, Junichi, Watanabe, Takeo, Kinoshita, Hiroo
Format Journal Article
LanguageEnglish
Published 01.06.2009
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.48.06FC08