Deposition of superhard amorphous carbon films by pulsed arc sources

Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films...

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Bibliographic Details
Published inIEEE transactions on plasma science Vol. 25; no. 4; pp. 685 - 688
Main Authors Scheibe, H.-J., Schultrich, B., Ziegele, H., Siemroth, P.
Format Journal Article
LanguageEnglish
Published New York IEEE 01.08.1997
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Adhesives
Amorphous materials
Carbon
Coatings
Crystalline materials
Crystallization
Plasma
Plasma applications
Plasma materials processing
Plasma measurements
Plasma properties
Plasma temperature
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Summary:Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films show superior behavior in wear and slide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0093-3813
1939-9375
DOI:10.1109/27.640686