Deposition of superhard amorphous carbon films by pulsed arc sources
Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films...
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Published in | IEEE transactions on plasma science Vol. 25; no. 4; pp. 685 - 688 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.08.1997
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, high smoothness, and low adhesion activity to other materials which are in contact with them, these films show superior behavior in wear and slide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0093-3813 1939-9375 |
DOI: | 10.1109/27.640686 |