Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub- 100 nanometer lithography processes

In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources, fabrication of multilayer x-ray mirrors, and patterning of reflection masks. We are in the process of optimization of a laser-pla...

Full description

Saved in:
Bibliographic Details
Published inMicroelectronic engineering Vol. 21; no. 1; pp. 67 - 70
Main Authors Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H.-J., van der Wiel, M.J., Schlatmann, R., Verhoeven, J., van der Drift, E.W.J.M., Romijn, J., Rousseeuw, B.A.C., Voβ, F., Desor, R., Nikolaus, B.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.04.1993
Online AccessGet full text

Cover

More Information
Summary:In this paper we present the status of a joint development programme on soft x-ray projection lithography (SXPL) integrating work on high brightness laser plasma sources, fabrication of multilayer x-ray mirrors, and patterning of reflection masks. We are in the process of optimization of a laser-plasma x-ray source and measured the conversion-efficiency of laser light into x-rays. Furthermore we present results of etching patterns in x-ray reflection masks and we discuss improved deposition techniques to produce multilayer coatings with enhanced reflectivity.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(93)90028-4