A KrF oscillator system with uniform profiles
A KrF oscillator system that has produced highly uniform flat-top focal distributions is described. The oscillator system is part of a large laser system that will utilize the echelon-free induced spatial incoherence technique to obtain uniform illumination of planar targets for fusion research. Wit...
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| Published in | Optics communications Vol. 106; no. 1; pp. 113 - 122 |
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| Main Authors | , |
| Format | Journal Article |
| Language | English |
| Published |
Elsevier B.V
01.03.1994
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| Online Access | Get full text |
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| Summary: | A KrF oscillator system that has produced highly uniform flat-top focal distributions is described. The oscillator system is part of a large laser system that will utilize the echelon-free induced spatial incoherence technique to obtain uniform illumination of planar targets for fusion research. With this system, focal profiles with small long scale length nonuniformities have been obtained. The nonuniformity was determined by performing a least-squares fit to a series of profiles, and calculating the deviation of each fit from a flat-top profile. With a linear fit, the deviation averaged over the series is ±0.5%, and with a quadratic fit, it is ±1.4%. Details of the oscillator system configuration, focal uniformity measurement techniques, and resulting focal profiles are presented. |
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| ISSN: | 0030-4018 1873-0310 |
| DOI: | 10.1016/0030-4018(94)90066-3 |