Plasma polymerized acetylene thin film by pulsed discharge

Plasma polymerization of acetylene was performed by using a pulsed rf discharge. Capacitively coupled discharge was initiated in a box type reactor at a uniform flow of an acetylene/argon mixture gas. A 2–10 nm scale ultrathin hydrocarbon film was deposited on a silicon wafer. The distribution of th...

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Bibliographic Details
Published inThin solid films Vol. 281; pp. 536 - 538
Main Authors Uchida, T., Senda, K., Vinogradov, G.K., Morita, S.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.08.1996
Subjects
Acetylene
Growth mechanism
Optical spectroscopy
Plasma processing and deposition
Optical spectroscopy
Plasma processing and deposition
Growth mechanism
Acetylene
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Summary:Plasma polymerization of acetylene was performed by using a pulsed rf discharge. Capacitively coupled discharge was initiated in a box type reactor at a uniform flow of an acetylene/argon mixture gas. A 2–10 nm scale ultrathin hydrocarbon film was deposited on a silicon wafer. The distribution of thickness was measured by an eliipsometer. The thickness increased nonlinearly with distance from the monomer inlet. This means that secondary gas phase products took part in the film formation.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(96)08725-1