Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists

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Published inApplied physics express Vol. 1; p. 36001
Main Authors Matsui, Yoshinori, Sugawara, Hidekazu, Seki, Shu, Kozawa, Takahiro, Tagawa, Seiichi, Itani, Toshiro
Format Journal Article
LanguageEnglish
Published 01.03.2008
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Author Matsui, Yoshinori
Itani, Toshiro
Sugawara, Hidekazu
Seki, Shu
Kozawa, Takahiro
Tagawa, Seiichi
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Wendt (APEX-1-036001-19) 1983; 28
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