Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists
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Published in | Applied physics express Vol. 1; p. 36001 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
01.03.2008
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Online Access | Get full text |
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ISSN: | 1882-0778 1882-0786 |
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DOI: | 10.1143/APEX.1.036001 |