Processing techniques for sensor materials; A review

Silicon is an auspicious material for the fabrication of sensors. At the same time silicon is not amenable for the integration of different types of sensors. In device fabrication semiconductor technology etching is very much necessary to selectively vanish the materials from a minute film with or w...

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Bibliographic Details
Published inMaterials today : proceedings Vol. 55; pp. 430 - 433
Main Authors Anand, Jose, Nirmala Devi, K., Edward Kennedy, Z., Dhanalakshmi, R.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.01.2022
Subjects
Etching
Materials
Sensitivity
Sensors
Silicon
Sensitivity
Etching
Silicon
Sensors
Materials
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Summary:Silicon is an auspicious material for the fabrication of sensors. At the same time silicon is not amenable for the integration of different types of sensors. In device fabrication semiconductor technology etching is very much necessary to selectively vanish the materials from a minute film with or without proper structures on the exterior of the substrate material. The etching procedure removes the identified region on the surface so as to deposit the other materials. This helps to obtain functional structures on the substrate. At the same time the wafer is protected by using a photoresist material such as silicon nitride. This paper describes the process of sensor fabrication and the materials used for the fabrication of semiconductor. The primary objective is to obtain better performance levels, manufacturability, reliable and cost effective product in Integrated Circuit (IC) fabrication industry.
ISSN:2214-7853
2214-7853
DOI:10.1016/j.matpr.2021.12.597