Electron-phonon interaction in In-induced structures on Si(111) from first-principles
Electron-phonon interaction in the Si(111)-supported rectangular phases of In is investigated within the density-functional theory and linear-response. For both single-layer and double-layer structures, it is found that the phonon-induced scattering of electrons is almost exclusively determined by v...
Saved in:
Published in | Physical chemistry chemical physics : PCCP Vol. 23; no. 13; pp. 7955 - 796 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
England
Royal Society of Chemistry
07.04.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Electron-phonon interaction in the Si(111)-supported rectangular
phases of In is investigated within the density-functional theory and linear-response. For both single-layer and double-layer
structures, it is found that the phonon-induced scattering of electrons is almost exclusively determined by vibrations of In atoms. It is shown that the strength of electron-phonon coupling at the Fermi level
λ
(
E
F
) increases almost twofold upon adding the second In layer. One of the reasons is that additional low-frequency modes appear in the phonon spectrum, which favors a strong enhancement of
λ
(
E
F
). The agreement of the calculated parameter
λ
(
E
F
) = 0.99 for a double-layer structure as well as the superconducting transition temperature
T
c
= 3.5 K with experimental estimates indicates that the discovered superconducting phase is probably a double-layer rectangular
-In structure on Si(111) with a coverage of 2.4 ML. This conclusion is also supported by good agreement between the calculated electron band structure and ARPES measurements.
Electron-phonon interaction in the Si(111)-supported rectangular
phases of In is investigated within the density-functional theory and linear-response. |
---|---|
Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1463-9076 1463-9084 |
DOI: | 10.1039/d0cp05234e |